Laboratory of Physical Chemical and Organic Processes

  • Profilometer NanoMap model 500LT

      Researcher manipulating Profilometer NanoMap model 500LT
      • Description: Mechanical profilometer with tips of 2um, 5um, 12.5um and 25 um of curvature radius and resolution of 0.1nm (Z) and 0.1um XY. Performs critical measurements of films such as: nanosized surface thickness and roughness, required in microelectronics, semiconductors, solar cells, LEDs, the medical field, and materials research. It has an automatic sample and tip sampling approach and can scan samples up to 150x150x1.5mm with 1 million points, generating 2D and 3D sample maps.
      • Fabrication Year: 2013
  • Organic Material Inkjet printing Dimatix model DMP-28

      Researcher handling Organic Material Inkjet printing  Dimatix model DMP-28
      • Description: It allows localized deposition of organic and biological functional inks to generate patterns for device prototyping. It uses a 1.5mL disposable electric piezo ink cartridge. This printer can create and define patterns in an area of ​​about 200 x 300 mm on substrates up to 25 mm thick with an adjustable Z height and the vacuum work table for fixing the substrate can have a temperature adjusted up to 60° C.
      • Fabrication Year: 2007
  • Metalic Material Inkjet printing Dimatix model DMP-28

      Researcher manipulating Metalic Material Inkjet printing  Dimatix model DMP-28
      • Description: It allows the localized deposition metallic precursor inks in order to generate patterns for devices prototyping. Uses disposable electric piezo inkjet cartridge with 1.5mL capacity. This printer can create and define patterns in an area of ​​about 200 x 300 mm on substrates up to 25 mm thick with an adjustable Z height and the vacuum work table for fixing the substrate can have a temperature adjusted up to 60 ° C.
      • Fabrication Year: 2009
  • High vacuum thermal evaporator Ewards model EV400

      High vacuum thermal evaporator Ewards model EV400
      • Description: The EV400 vacuum deposition system is manufactured by Gera LTDA. They have two supports for metal crucibles for thermal evaporation of materials and thin metal films of Cr, Cu, Au, Al, Ag, Ti, among others with base pressure in 5.0E-7Torr. It has a planetarium for accommodating up to 3 4 "wafers with 2.5% uniformity variation between center and edge.
      • Fabrication Year: 2013
  • Glovebox system with spinner and organic / inorganic thermal evaporator integrated in a inert atmosphere Mbraun model LAB master sp

      Researcher manipulating the glovebox system
      • Description: The glovebox inert environment system has two gloveboxes, one equipped with a spinner for solution-bssed materials, preparing and testing samples, and other equipped with a vacuum thermal deposition with 6 sources for organic/inorganic materials deposition. Both have a humidity control and purification system for operation in the range of 0.1ppm H2O and 50ppm O2.
      • Fabrication Year: 2011
  • Ultrasonic Spray Deposition System Sonotek model ExactaCoat

      Overview of the Ultrasonic Spray Deposition System Sonotek model ExactaCoat
      • Description: The ultrasonic spray system allows the deposition of materials in solution and dispersions by means of a head that operates on 3 programmable axes and it is ideal for applying precision ultrasonic spray coatings on a laboratory scale. The vacuum and heated sample holder (max. 100 oC) can accommodate substrates up to 400mmx400mmx100mm (15.75 "x 15.75" x 3.94 ") with precision and repeatability of up to ± 2%. The control software allows importing images and patterns.
      • Fabrication Year: 2009
  • Rapid Thermal Processing (RTP) Allwin21 model AccuThermo AW 61

      Researcher handling Rapid Thermal Processing (RTP) Allwin21 model AccuThermo AW 61
      • Description: RTP uses high intensity visible radiation from halogen lamps to heat wafers and flat substrates. The quartz sample holder can accommodate wafers of up to 6 "x 3mm for periods of 1 to 9999 seconds under temperatures of 100 to 1250 ° C. It is configured for up to 6 lines of interstate or reactive gases (Ar, N2, O2, NH4, and two extra lines).
      • Fabrication Year: 2011