LAmina

Lithography

  • KARL Suss MJB3 UV400 Contact Mask Aligner

      Researcher viewing UV400 contact mask aligner Karl Suss Model MJB3
      • Description: The mask aligner is used in photolithography to transfer features. The MJB3 offers front side illumination for contact lithography. The aligner is equipped with a 350 Watt mercury arc lamp that applies a typical intensity of ~20 mW/cm² at 405 nm wavelength.
      • Fabrication Year: 2001

  • UV Direct Write Laser system Heidelberg Instruments model DWL 66-fs (DWL)

      Panoramic view of the Heidelberg Instruments UV Laser Direct Lithography system model DWL-66FS (DWL)
      • Description: The DWL 66FS laser lithography system is a high resolution pattern generator for low volume mask making and direct writing. The capabilities and flexibility of this system allows to use this research tool in MEMS, BioMEMS, Micro Optics, ASICs, Micro Fluidics, Sensors, CGHs, and all other applications that require microstructures. It can be used for mask making or direct exposure on basically any flat material coated with photoresist.
      • Fabrication Year: 2011

  • UV Mask Copier Machine Tamarack series 155

      Researcher working on Tamarack 155 Series UV Mask Copier
      • Description: Broadband contact and proximity exposure with manual load and alignment of 4, 8 and 12 inch square substrates. The Tamarack 155 Vacuum Contact Printer is used to produce a copy of a master plate at a sizing ratio of 1:1.
      • Fabrication Year: 1995