• Scannign electron microscope with field-emission gun - FEG-SEM Tescan modelo Mira 3 XMU with e-beam lithography and with EDS 60mm Bruker

      • Description: FEG (Field-Emission Gun) Tescan model Mira 3 XMU with 1.0 nm resolution at 30kV, several detectors (SE, BSE, EBIC, STEM and EDS) and e-beam lithography system. The large sample-holder accommodates samples up to 10x10x5cm. The system allows patterning and characterization of nanostructures and nanomaterials, failure analysis in electronic components and circuits, and characterization of materials and 3D printed objects.
      • Fabrication Year: 2018
  • Atomic Force Microscope Nanosurf model EasyScan 2

      • Description: Atomic force microscopy system with a simple and intuitive interface for analysis of nanostructured systems, devices and materials. It operates in contact and non-contact modes with the techniques AFM-CM / NCM, EFM, MFM, nanolithography, etc.
      • Fabrication Year: 2010
  • Fluorescence optical microscope Olympus model MX61

      • Description: Optical microscopy and fluorescence system quiped with CCD camera 1.024 x 768 pixel SC30 and software for data analysis. With 5 objectives with 5, 10, 20, 50 and 100x magnification and automatic change allows for measurements in bright field and dark field with reflected light (Xenon) and transmitted tungsten. Polarizing filters with angle adjustment, optical density filters of 25% and 6% and filter for fluorescence microscopy with 450-480nm band-pass.
      • Fabrication Year: 2009